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ATOMIC SCALE PROCESSES FOR MANIPULATION OF MATTER
WELCOME TO THE BANERJEE LAB
Our research aims to understand atomic scale processes that can lead to the development of new nanomaterials for electronics and energy applications. We are specifically interested in atomic layer deposition and atomic layer etching processes that can help engineer surfaces and interfaces with atomic scale resolution.
Professor Banerjee is the Co-PI for the NSF Funded PREM Center for Ultrafast Dynamics and Catalysis in Emerging Materials. We are always looking for dedicated undergraduate and graduate students. Contact us here!
NEWS
Featured Publications ...
August 20, 2019
Featured on the Journal's web page, Dr. Zhengning Gao and Professor Banerjee's article is now live and OPEN ACCESS in the Journal of Vacuum Science and Technology - A.
With a view to aid practitioners of ALD develop better ZnO based transparent conducting oxides, this article establishes generalized relationships for (1) the role of ALD process parameters, (2) the impact of these parameters on the structure of the ZnO matrix, and (3) the impact of dopants on the optical and electrical properties.
Jan 29, 2019
Published in Chemistry of Materials, we demonstrate deposition of ruthenium (Ru) metal films at a temperature of 160 C. The molecule used to deposit Ru film is Ru(DMBD)(CO)3 which is air stable and the co-reactant is H2O. The work was performed with our industrial collaborators, EMD Performance Materials and partners at UCF.
Jan 29, 2019
Published in Chemistry of Materials, we demonstrate deposition of ruthenium (Ru) metal films at a temperature of 160 C. The molecule used to deposit Ru film is Ru(DMBD)(CO)3 which is air stable and the co-reactant is H2O. The work was performed with our industrial collaborators, EMD Performance Materials and partners at UCF.
PEOPLE
Student and post docs are our greatest asset!
CREATING BETTER SAWING TECHNOLOGY FOR Si INGOTS FOR SOLAR APPLICATIONS
When silicon (Si) wafers are produced by sawing Si ingots, a lot of Si is wasted as unusable powder (swarf). To reduce this wastage, Si sawing technology has to be improved. One possible avenue is to use thinner sawing wires than currently used by industry (75 - 100 microns). In this award funded by the National Science Foundation, we are developing new, thinner wires (20 microns) for sawing Si ingots.
PLASMONS FOR ENHANCED OPTICAL NON-LINEARITY
Gold (Au) nanorods are unique in that their localized surface plasmon frequencies lie in the visible range. We are exploiting this effect in massively scalable nanostructures to induce optical non-linearity in metal - insulator - metal devices. Funded by the Army Research Office, we hope to unravel the fundamental mechanisms by which plasmonically excited electrons interact with the external world!
RESEARCH
Actively funded research initiatives in the lab come from funding agencies such as, NSF, ARO and corporations such as, EMD Performance Materials. We acknowledge their support!
NEW PRECURSOR MOLECULES FOR METAL ALD FILM DEVELOPMENT
Processes for ultrathin, metal films are of importance for the semiconductor, battery and renewables industry as new architectures, materials and devices shrink in size and scale in complexity. We are working with EMD Performance Materials to develop new atomic layer deposition (ALD) processes for metal thin films.
PLASMONIC BIOSENSORS
We are building new sensors for molecular detection of biomarker molecules associated with difficult to detect diseases.These biosensors exploit changes to the excitation of electrons on the surface of Au nanoparticles when illuminated by light of certain wavelengths and under different environments to create electrical signals for detection. With collaborators from Washington University this grant is funded through the National Science Foundation.
CONTACT US
Room 208, Research I Building, University of Central Florida, Orlando, FL 32816-0120
407-823-0190